We are pleased to announce that Comptek Solutions will be exhibiting at ALD 2024 AVS from August 4th to 7th, 2024, at Booth #45 at the Messukeskus in Helsinki, Finland.
The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024), featuring the 11th International Atomic Layer Etching Workshop (ALE 2024), is a premier event dedicated to the advanced science and technology of atomic layer controlled deposition of thin films and atomic layer etching.
During ALD 2024 AVS, we will be celebrating the 50th anniversary of Dr. Tuomo Suntola's pioneering work on ALD, where Dr. Suntola and his team filed the first patent on Atomic Layer Epitaxy in 1974.
At this leading tech forum uniting industry professionals and scientists, we will be demonstrating how our innovative Kontrox passivation technology synergizes with current ALD techniques, leading to superior passivation effects and ultimately enhancing the efficiency and robustness of power electronics and next-generation display devices.
On this note, we especially invite visitors to explore our cutting-edge pilot line equipment designed for substrates up to 8 inches. Tailored for both power electronic and µLED applications, this innovative cluster tool leverages plasma-enhanced ALD equipment to maximize ALD solution capabilities, which is seamlessly integrated with our breakthrough Kontrox passivation technology in an ultra-high vacuum environment. The showcase underscores our significant in-house capabilities in delivering advanced passivation solutions for full-sized GaN substrates, enabling us to offer full stack solutions and advanced samples for customers in industrial-scale settings.
Join us at the ALD 2024 AVS conference to discover firsthand how our state-of-the-art solutions can elevate your ALD applications to the next level.
Comptek's ALD 2024 AVS exhibition details:
When: August 4th to 7th, 2024
Where: Booth #45, Hall 3
Venue: Messukeskus, Messuaukio 1, Helsinki, 00520, Finland
For conference details and registration information, please visit here.
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